This comprehensive volume provides an in-depth discussion of the
fundamentals of cleaning and surface conditioning of semiconductor
applications such as high-k/metal gate cleaning, copper/low-k
cleaning, high dose implant stripping, and silicon and SiGe
passivation. The theory and fundamental physics associated with wet
etching and wet cleaning is reviewed, plus the surface and
colloidal aspects of wet processing. Formulation development
practices and... more...